Positive type actinic ray-curable dry film and pattern-forming method by use of the same

ABSTRACT

A method of forming a resist pattern film. A positive type actinic ray decomposing and developing dry film is applied onto a surface of a coating substrate so that the surface of the coating substrate may face to the urethane resin layer of the dry film. Then, the dry film may be heat treated. The non-actinic ray-curable substrate of the dry film, then, is optionally stripped, and is heat treated if it has not already been heat treated. Then, an actinic ray is irradiated through a mask or directly onto the surface of the dry film so as to obtain an intended pattern and is optionally heat treated. The non-actinic ray-curable substrate which was not previously stripped is, then, stripped. Then, the positive type actinic ray-curable urethane resin layer is subjected to a developing treatment. Finally, an unnecessary area of the urethane resin layer to form a resist pattern film is removed.

This application is a divisional application of U.S. application Ser.No. 09/630,191 filed Aug. 1, 2000 now U.S. Pat. No. 6,555,286.

BACKGROUND OF THE INVENTION

(1) Field of the Invention

The present invention relates to a positive type actinic ray-decomposingand developing dry film formed from an actinic ray-decomposing anddeveloping resin composition containing a resin having a urethanelinkage, showing high sensitivity and good film-handling properties, andcapable of forming a pattern which is useful in the formation of acircuit in an electronic device, a material for use in printing.

(2) Description of Background Art

A method of forming a photo-curable resist film which comprises coatingor printing a liquid photo-curable resist composition onto a printedcircuit board having a through-hole and/or non-through-hole (hereinaftermay be simply referred to as a through-hole) according to a coating orprinting method such as spray coating, roll coating, silk screenprinting or the like, has well known in the art. However, the abovemethods had such problems that coating or printing of the liquid resistcomposition directly onto the printed circuit board makes it impossibleto form a satisfactory resist film in the interior of the through-hole,resulting in that partial or complete dissolution in an etching solutionof a conductive film such as copper, silver and the like in the interiorof the through-hole during an etching step may cause to produce troublessuch as breaking and the like.

For the purpose of protecting the through-hole from the etchingsolution, in the recent years, a positive type film resist formed bycoating a positive type photo-decomposing and developing liquid resistcomposition onto a substrate has been used. As an example of thepositive type photo-decomposing and developing liquid resistcomposition, a visible light-sensitive composition comprising a carboxylgroup-containing polymer, a polyvinyl ether compound and a compoundproducing an acid by decomposition due to irradiation of an actinic rayis disclosed in, for example, Japanese Patent Application Laid-Open Nos.313134/94, 313135/94, 313136/94, 308733/94, 295064/64, 146552/95, andthe like.

The above composition is such a photo-decomposing and developingcomposition that heating of a coating film formed from the compositiontakes place crosslinking due to addition reaction between carboxyl groupand vinyl ether group so as to be insoluble in a solvent and an aqueousalkali solution, and that irradiation of an actinic ray thereonto andheating thereafter breaks down a crosslinked structure due to acatalytic action of an acid produced so that an irradiated area may bemade soluble again in a solvent and an aqueous alkali solution.

However, a positive type dry film formed by a process which comprisescoating the above-positive type photo-decomposing and developingcomposition onto a substrate such as polyethylene terephthalate and thelike followed by drying, produced such problems that (1) because ofunsatisfactory mechanical properties of the positive typephoto-decomposing and developing coating film, cracking and separationfrom the substrate of the coating film take place on winding a dry filmdried and formed as above, resulting in making difficult handling of thedry film, that (2) in a method of forming a positive typephoto-decomposing and developing coating film onto the surface of aprinted circuit board by use of a dry film, which method comprisesfacing and folding the positive type photo-decomposing and developingcoating film onto the printed circuit board, heating the dry film so asto be laminated and separating the polyethylene terephthalate substratefrom the positive type photo-decomposing and developing coating film,because of poor adhesion properties between the positive typephoto-decomposing and developing coating film and the substrate, afterthe above separating step, the positive type photo-decomposing anddeveloping coating film may partly or wholly remain on the surface ofthe polyethylene terephthalate substrate, and that (3) because ofunsatisfactory mechanical properties of the positive typephoto-decomposing and developing coating film, an erosion of the coatingfilm with an etching solution may take place to be washed out, resultingin making it impossible to form a fine resist pattern.

As an example of a positive type photo-decomposing and developing dryfilm, Japanese Patent Application Laid-Open No. 506106/93 discloses adry film photoresist prepared by forming a solid photo-decomposing anddeveloping layer comprising a polymer having a photo-acid-unstable groupand a photo-acid generator onto a flexible thin polymer film substrate.That is, the above dry film is such that the photo-acid-unstable groupin the polymer may be decomposed by the action of an acid generated fromthe photo-acid generator or irradiation, so that an irradiated area onlymay be dissolved in a developing solution to provide a positive typeimage, but had such drawbacks as to be unable to form a fine imagebecause of unclear correspondence of nondissolution or dissolution to anonirradiated coating film area or an irradiated coating film area.

SUMMARY OF THE INVENTION

It is an object of the present invention to provide a positive typeactinic ray decomposing and developing dry-film which shows goodmechanical properties so as to be easy to handle and is capable offorming a fine resist pattern.

It is another object of the present invention to provide a method offorming a pattern, which is capable of forming a fine resist pattern byuse of the above dry film.

That is, firstly the present invention provides a positive type actinicray decomposing and developing dry film having, on the surface of anonactinic ray decomposing and developing substrate, a solid positivetype actinic ray decomposing and developing urethane resin layer formedby coating and heat-crosslinking (1) a resin composition containing, asessential components, (A₁) at least one unsaturated compound selectedfrom the group consisting of a vinyl ether group-containing compound,vinyl ester group-containing compound and propenyl estergroup-containing compound, (B₁) an acid group-containing urethane resinhaving a weight average molecular weight of 1.000 to 200,000 and an acidgroup content in the range of 0.5 to 10 equivalents per one kg of theresin, and (C) a photo-acid generator; (2) a resin compositioncontaining, as essential components, (A₂) at least one unsaturatedurethane based compound selected from the group consisting of a vinylether urethane based compound, vinyl ester urethane based compound andpropenyl ester urethane based compound, (B₂) at least one resin selectedfrom the group consisting of (a) a carboxyl group and hydroxyphenylgroup-containing polymer, (b) a carboxyl group-containing polymer and(c) a hydroxyphenyl group-containing polymer, and (C) a photo-acidgenerator; or (3) a resin composition containing, as essentialcomponents, (A₂) at least one unsaturated urethane based compoundselected from the group consisting of a vinyl ether urethane basedcompound, vinyl ester urethane based compound and propenyl esterurethane based compound, (B₁) an acid group-containing urethane resinhaving a weight average molecular weight of 1,000 to 200,000 and an acidgroup content in the range of 0.5 to 10 equivalents per one kg of theresin, and (C) a photo-acid generator.

Secondly, the present invention provides a method of forming a patternwhich comprises the following steps:

-   (1) applying the positive type actinic ray-decomposing and    developing dry film as above described onto the surface of a coating    substrate so that the surface of the coating substrate may face to    the urethane resin layer of the dry film,-   (2) optionally stripping the nonactinic ray-decomposing and    developing substrate of the dry film,-   (3) irradiating an actinic ray through a mask or directly onto the    surface of the dry film so as to obtain an intended pattern,    optionally heat treating,-   (4) stripping the nonactinic ray-decomposing and developing    substrate not stripped in the above step (2),-   (5) subjecting the positive type actinic ray-decomposing and    developing urethane resin layer to a development treatment, and-   (6) removing an unnecessary area of the urethane resin layer to form    a resist pattern film, either step (1) or (2) including a step of    heat treating.

DETAILED DESCRIPTION OF THE INVENTION

The nonactinic ray-decomposing and developing substrate is such asubstrate that, for example, a positive type actinic ray-decomposing anddeveloping resin layer may be fixed onto the substrate and that anapplication to the surface of a coating Page 6 has been amended asfollows:

substrate such as a printed circuit board and the like may easily becarried out. Examples of the substrate may include films of polyethyleneterephthalate, aramide, captone, polymethylpentene, polyethylene,polypropylene, and the like. Of these, polyethylene terephthalate filmis particularly preferable from the standpoints of cost and provision ofa photo-decomposing and developing dry film having good characteristics.For the purpose of making release easy, the above substrates may alsoinclude ones treated with a release agent such as silicone, wax,fluorocarbon resin, and the like. The substrate has a film thickness inthe range of 1 to 100 μm particularly 10 to 40 μm. After application,the substrate may be released and removed.

The positive type actinic ray-decomposing and developing resincomposition may be coated or printed onto the above substrates accordingto a roller coating method, spray coating method, silk screen printingmethod and the like to prepare a photo-decomposing and developingpositive type dry film. For the purpose of enhancing releasecharacteristics of the photo-developable resin composition film from thesubstrate, the substrate may be coated in advance with a release agentsuch as silicone, wax, and the like. The positive type ray-decomposingand developing resin layer may have a film thickness in the range ofusually 1 to 100 μm, particularly 5 to 40 μm.

The resin composition coated or printed on the surface of the substratemay preferably be heated at about 50 to 150° C., preferably about 80 to120° C. prior to being heat laminated onto the substrate so that acoating layer may be crosslinked. The result is that mechanicalproperties, such as folding properties and the like, of thephoto-decomposing and developing positive type dry film may be improved.

The positive type actinic ray-decomposing and developing resincomposition used in the present invention is such that an irradiation ofthe actinic ray may decompose the resin composition so as to be solublein a developing solution.

Respective components of the positive type actinic ray-decomposing anddeveloping urethane resin layer used in the dry film of the presentinvention may be explained hereinafter.

Unsaturated Compound (A₁):

The unsaturated compound (A₁) is at least one unsaturated compoundselected from the group consisting of a vinyl ether group-containingcompound, vinyl ester group-containing compound and propenyl estergroup-containing compound.

The vinyl ether group-containing compound is a low molecular weight orhigh molecular weight compound having about 1 to 4, preferably 2 to 4 ofvinyl ether group represented by the formula; —R′—O—CH═CH₂, wherein R′represents a straight chain or branched chain alkylene group having 1 to6 carbon atoms, for example, ethylene, propylene, butylene and the like,in one molecule, and may include, for example, condensation products ofhalogenated alkyl vinyl ether such as chloroethyl vinyl ether and thelike with polyphenol compounds such as bisphenol A, bisphenol F,bisphenol S, phenol resin and the like, or with polyols such as ethyleneglycol, propylene glycol, trimethylol propane, pentaerythritol and thelike, and the like.

The vinyl ester group-containing compound is a low molecular weight orhigh molecular weight compound having about 1 (one) to 4, preferably 2to 4 of vinyl ester group in one molecule, and may include, for example,vinyl acetate, vinyl propionate, vinyl lactate, vinyl butyrate, vinylisobutyrate, vinyl caproate, vinyl isocaproate, vinyl pivalate, vinylcaprate, Veova monomer (marketed by Shell Kagaku K.K.), and the like.

The propenyl ester group-containing compound is a low molecular weightor high molecular weight compound having about 1 (one) to 4, preferably2 to 4 of propenyl ester group in one molecule, and may include, forexample, isopropenyl acetate, isopropenyl propionate, and the like.

Of the unsaturated compound (A₁), use of the vinyl ethergroup-containing compound is preferable in that an addition reactionbetween carboxyl group in the resin (B₁) and vinyl ether group in thecompound (A₁) may easily take place.

Unsaturated Polyurethane Compound (A₂)

The unsaturated compound (A₂) is at least one unsaturated urethane basedcompound selected from the group consisting of a vinyl ether urethanebased compound, vinyl ester urethane based compound and propenyl esterurethane based compound.

The vinyl ether urethane based compound is an unsaturated compoundhaving about 1 to 4, preferably 2 to 4 of an unsaturated ether groupsuch as vinyl ether group represented by the formula: —R′—O—CH═CH₂,wherein R′ represents a straight chain or branched chain alkylene grouphaving 1 to 6 carbon atoms, for example, ethylene, propylene, butyleneand the like, 1-propenyl ether group, butenyl ether group and the likein one molecule, and having at least one urethane linkage in onemolecule, and further may include, for example, reaction products of thefollowing polyisocyanate compounds with, optionally the above hydroxylgroup-containing compound containing at least two hydroxyl groups in onemolecule, and hydroxyalkyl vinyl ether such as hydroxyethyl vinyl etherand the like; condensation products of polyphenol compounds such asbiephenol A, bisphenol F, bisphenol S, phenol resin and the like,polyols such as ethylene glycol, propylene glycol, trimethylol propane,pentaerythritol and the like, and the following polyisocyanate compoundswith halogenated alkyl vinyl ether such as chloroethyl vinyl ether andthe like, and the like. Of these, the condensation product of thepolyphenol compound with the halogenated alkyl vinyl ether and thereaction product of the polyisocyanate compound having an aromatic ringwith the hydroxyalkyl vinyl ether are preferable from the standpoints ofanti-etching properties, precision of a pattern to be formed, and thelike.

The vinyl ester urethane based compound is a low molecular weight orhigh molecular weight compound having about 1 (one) to 4, preferably 2to 4 of vinyl ester group in one molecule and at least one urethanelinkage in one molecule, and may include, for example, reaction productsof the following polyisocyanate compound, optionally a hydroxylgroup-containing compound containing at least two hydroxyl groups in onemolecule, and a hydroxyvinyl ester such as vinyl lactate and the like.

The propenyl ester urethane based compound is a low molecular weight orhigh molecular weight compound having about 1 (one) to 4, preferably 2to 4 of propenyl ester group in one molecule, and at least one urethanelinkage in one molecule, and may include, for example, the followingpolyisocyanate compound, optionally a hydroxyl group-containing compoundcontaining at least two hydroxyl groups in one molecule, andhydroxypropenyl ester.

Of the unsaturated compound (A₂), use of the vinyl ether urethane basedcompound is preferable in that an additional reaction between carboxylgroup in the resin (B₁) or (B₂) and vinyl ether group in the compound(A₂) may easily take place.

Examples of the above polyisocyanate compound may include aliphaticdiisocyanate compound such as hexamethylene diisocyanate,trimethylenediisocyanate, 1,4-tetramethylene-diisocyanate,pentamethylenediisocyanate, 1,2-propylenediisocyanate,1,2-butylenediisocyanate, trimethylhexamethylene diisocyanate, dimeracid diisocyanate, lysinediisocyanate, 2,3-butylenediisocyanate,1,3-butylene-diisocyanate and the like; alicyclic diisocyanate compoundsuch as isophoronediisocyanate, 4,4′-methylenebis(cyclohexylisocyanate), methylcyclohexane-2,4-(or -2,6-)diisocyanate, 1,3-(or 1,4-)-di(isocyanatomethyl)cyclohexane,1,4-cyclohexanediisocyanate, 1,3-cyclopentanediisocyanate,1,2-cyclohexanediisocyanate and the like; aromatic diisocyanate compoundsuch as xylylenediisocyanate, methaxylylene diisocyanate,tetramethylxlylenediisocyanate, tolylenediisocyanate,4,4′-diphenyl-methanediisocyanate, 1,5-naphthalenediisocyanate,1,4-naphthalenediisocyanate, 4,4′-toluidinediisocyanate,4,4′-diphenyletherdiisocyanate, (m- or p-) phenylenediisocyanate,4,4′-biphenylenediisocyanate,3,3′-dimethyl-4,4′-biphenylenediisocyanate, bis(4-isocyanatophenyl)sulfone, isopropylidene bis(4-phenylisocyanate) and the like; otherpolyisocyanates, for example, polyisocyanate compounds having three ormore isocyanate group such as triphenylmethane-4,4′,4″-triisocyanate,1,3,5-triisocyanatobenzene, 2,4,6-triisocyanatotoluene,4,4′-dimethyldiphenylmethane-2,2′,5,5′-tetraisocyanate and the like,adducts prepared by reacting a polyol such as ethylene glycol, propyleneglycol, 1,4-butylene glycol, polyalkylene glycol, trimethylolpropane,hexanetriol and the like with a polyisocyanate compound in an excessamount of isocyanate group relative to hydroxy group in the polyol,biuret type adducts of hexamethyllenediisocyanate,isophoronediisocyanate, tolylenediisocyanate, xylylenediisocyanate,4,4′-diphenylmethanediisocyanate, 4,4′-methylenebis(cyclohexylisocyanate) and the like, isocyanuric ring type adducts,and the like.

Of these, preferable examples may include isophoronediisocyanate,xylylenediisocyanate, tolylenediisocyanate,1,6-hexamethylenediisocyanate, 2,2,4-trimethylhexamethylenediisocyanate,2,4,4-trimethylhexamethylenediisocyanate and the like.

Examples of the compound optionally used and having at least twohydroxyl groups in one molecule may include glycols such as ethyleneglycol, propylene glycol, polyethylene glycol having a molecular weightof 6000 or less, polypropylene glycol having a molecular weight of 6000or less, tetramethylene glycol, 1,4-butanediol, 1,3-butanediol,2,3-butanediol, 1,2-butanediol, 3-methyl-1,2-butanediol,1,2-pentanediol, 1,5-pentanediol, 1,4-pentanediol, 2,4-pentanediol,2,3-dimethyltrimethylene glycol, tetramethylene glycol,3-methyl-3,4-pentanediol, 3-methyl-4,5-pentanediol,2,2,4-trimethyl-1,3-pentanediol, 1,6-hexanediol, 1,5-hexanefdiol,1,4-hexanediol, 2,5-hexanediol, 1,4-cyclohexane dimethanol, neopentylglycol, neopentyl glycol hydroxypivalate, 1,4-cyclohexane dimethanol,tricyclodecan dimethanol, polycaprolactone, hydrogenated bisphenol A,hydrogenated bisphenol F, alkylene oxide adducts of hydrogenatedbisphenol A and hydrogenated bisphenol F, and the like; polyesterdiolssuch as bis(hydroxyethyl) terephthalate and the like, trihydric or morealcohols such as glycerin, trimethylolpropane, trimethyllolethane,diglycerin, triglycerin, 1,2,6-hexane triol, pentaerythritol,dipentaerythrital, sorbitol, mannitol and the like, polylactone polyolsprepared by addition reaction of lactones such as ε-caprolactone withthe above glycols and/or trihyclric or more alcohols, and the like.These may be used alone or in combination.

Of these, polyethylene glycol, polycaprolactone, polypropylene glycol,tetramethylene glycol, trimethylol propane and the like are preferable.

The compounds (A₁) and (A₂) may preferably include liquid ones at roomtemperature, or ones having a melting point or softening point in therange of 150° C. or lower, particularly 130° C. or lower on the groundthat an addition reaction of carboxyl group or phenol group in the resin(B₁) or (B₂) with vinyl ether group in (A₁) or (A₂) may easily takeplace.

Acid Group-containing Urethane Resin (B₁):

The acid group-containing urethane resin (B₁) is an urethane resinprepared by reacting a polyisocyanate compound, hydroxy acid compoundhaving at least one hydroxyl group and at least one acid group in onemolecule, and optionally a compound having at least one hydroxyl groupin one molecule according to the known process, and essentiallycontaining no free isocyanate group.

The above polyisocyanate compound may include the same ones as used inthe unsaturated compound (A₂).

Examples of the above hydroxy acid compound may include dimethylolpropionic acid, dimethylol butyric acid, dimethylol valeric acid,tartaric acid. 1,2-hydroxystearic acid, parahydroxybenzoic acid,salicylic acid, malic acid, lactic acid, hydroxyacetic acid,2,2-dimethyl-3-hydroxypropionic acid, and the like.

Optionally, a compound containing one hydroxyl group in one molecule,for example, methanol, ethanol, propanol, butanol, hexanol,cyclohexanol, benzyl alcohol and the like, may be used alone or incombination.

The acid group-containing urethane resin(B) has a weight averagemolecular weight in the range of about 1,000 to about 200,000,preferably about 5,000 to about 150,000, more preferably about 20,000 toabout 100,000, and has an acid group content in the range of about 0.5to about 10 equivalents, preferably about 0.5 to about 8 equivalents,more preferably about 0.5 to about 5 equivalents per one kg of theresin. An acid group content less than about 0.5/kg results in that acoating film formed by heating prior to irradiation of an actinic raymay show an unsatisfactory degree of crosslinking, and that a lowsolubility of an actinic ray-irradiated area in an alkali developingsolution may reduce developing properties. On the other hand, when morethan about 10 equivalents, the composition may show poor storagestability.

The resin (B₂) in the present invention may include (a) a carboxyl groupand hydroxyphenyl group-containing polyemer, (b) a carboxylgroup-containing polymer, (c) a hydroxyphenyl group-containing polymerand mixtures thereof.

Carboxyl Group and Hydroxylphenyl Group-containing Polymer (a):

The polymer (a) is a film-forming polymer having at least one carboxylgroup and at least one hydroxyphenyl group in one molecule, and mayinclude a copolymer of hydroxystyrene such as p-hydroxystyrene and thelike with a carboxyl group-containing polymerizable unsaturated monomer:a copolymer of hydroxystyrene, carboxyl group-containing monomer andother copolymerizable monomer, and the like.

Examples of the carboxyl group-containing polymerizable unsaturatedmonomer may include acrylic acid, methacrylic acid, crotonic acid,itaconic acid, and the like. Examples of other copolymerizable monomermay include C₁₋₁₂ alkyl esters of (meth)acrylic acid, for example,methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate,butyl (meth)acrylate, hexyl (meth)acrylate, octyl (meth)acrylate,2-ethylhexyl (meth)acrylate, nonyl (meth)acrylate, decyl (meth)acrylateand the like; C₂₋₆ hydroxyalkyl esters of (meth)acrylic acid, forexample, hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate,3-hydroxypropyl (meth)acrylate, hydroxybutyl (meth)acrylate, and thelike; vinyl aromatic compounds such as styrene, α-methylstyrene,p-tert-butylstyrene and the like; vinyl acetate, (meth)acrylonitrile,(meth)acrylamide, vinyl pyrrolidone, and the like. These monomers may beused alone or in combination.

The polymer (a) may also include a polymer prepared by condensationreaction with formaldehyde of phenolcarboxylic acids such ashydroxybenzoic acid, gallic acid, resorcinic acid and the like, or ofmixtures thereof with at least one of phenol, C₁₋₁₈ mono-, ordialkylphenol or naphthols and phenols selected from resorcin, catecohland the like.

The polymer (a) usually has a weight average molecular weight in therange of about 1,000 to about 200,000, particularly about 20,000 toabout 100,000, a carboxyl group content in the range of generally about0.5 to about 10 equivalents, particularly about 0.5 to about 5.0equivalents per one kg of the polymer, and a hydroxyphenyl group contentin the range of at least about 1.0 equivalent, particularly about 2.0 toabout 8.0 equivalents.

A carboxyl group content less than about 0.5 equivalent/kg results inthat a coating film formed by heating prior to irradiation of an actinicray may show an unsatisfactory degree of crosslinking, and that a lowsolibility of an actinic ray-irradiated area in an alkali developingsolution may reduce developing properties. On the other hand, when morethan about 10 equivalents/kg, the composition may show poor storagestability. On the other hand, a hydroxyphenyl group content less thanabout 1.0 equivalent/kg may result unsatisfactory degree of crosslinkingon crosslinking.

The polymer preferably has a glass transition temperature (Tg) in therange of about 0° C. or higher, particularly about 5 to about 70° C.When the Tg is lower than about 0° C., a sticky coating film may resultadhesion of foreign particles, dust, etc. so as to be difficult tohandle.

Carboxyl Group-containing Polymer (b):

The polymer (b) is a film-forming polymer containing at least onecarboxyl group in one molecule, and may include, for example; ahomopolymer of a carboxyl group-containing polymerizable unsaturatedmonomer, a copolymer of the carboxyl group-containing monomer with othercopolymerizable monomer; resins having carboxyl group in a molecularchain or at a molecular terminal and based on polyester, polyurethane,polyamide, and the like.

Examples of the carboxyl group-containing polymerizable unsaturatedmonomer may include acrylic acid, methacrylic acid, crotonic acid,itaconic acid, and the like. Examples of the other monomercopolymerizable with the above carboxyl group-containing monomer mayinclude C₂-C₆ hydroxyalkyl esters of (meth)acrylic acid, for example,methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate,butyl (meth)acrylate, hexyl (meth)acrylate, octyl (meth)acrylate,2-ethylhexyl (meth)acrylate, nonyl (meth)acrylate, decyl (meth)acrylateand the like; vinyl aromatic compounds such as styrene, α-methylstyrene,p-tert-butylstyrene and the like; vinyl acetate, (meth)acrylonitrile,(meth)acrylamide, vinyl pysrolidone and the like. These monomers may beused alone or in combination. Particularly preferable other monomers,from the standpoints of precision of an image pattern to be formed,etching-resistant properties etc., may include vinyl aromatic compoundssuch as styrene, α-styrene, C₂-C₆ alkyl-substituted styrene such asp-tert-butylstyrene and the like, and the like.

The carboxyl group-containing polymer (b) has a weight average molecularweight in the range of generally about 1,000 to about 200,000,particularly about 20,000 to about 100,000, and has a carboxyl groupcontent in the range of generally about 0.5 to about 10 equivalents,particularly about 0.5 to about 5.0 equivalents per one kg of thepolymer. A carboxyl group content less than about 0.5 equivalents/kg mayresult in that a coating film formed by heating prior to irradiation ofa visible light may show an unsatisfactory degree of crosslinking, andthat a low solubility of an irradiated area in an alkali developingsolution may reduce developing properties. On the other hand, when morethan about 10 equivalents, the composition may show poor storagestability.

The polymer (b) preferably has a glass transition temperature (Tg) inthe range of about 0° C. or higher, particularly about 5 to about 70° C.When the Tg is lower than about 0° C. a sticky coating film may resultadhesion of foreign particles, dust, etc. so as to be difficult tohandle.

The polymer (b) may be used in combination with the followinghydroxyphenyl group-containing polymer (c).

Hydroxyphenyl Group-containing Polymer (c):

The polymer (c) is a polymer containing at least one hydroxyphenyl groupin one molecule, and may include, for example, condensation products ofmonofunctional or polyfunctional phenol compound, alkylphenol compoundor mixtures thereof with carbonyl compound such as formaldehyde, acetoneand the like; homopolymer of hydroxyl group-containing vinyl aromaticcompound such as p-hydroxystyrene; copolymer of the hydroxylgroup-containing vinyl aromatic compound with copolymerizable monomer,and the like.

Examples of the monofunctional or polyfunctional phenol compound mayinclude compounds having 1 to 3 hydroxyl groups on the benzene ring, forexample, phenol, o-cresol, m-cresol, p-cresol, 3,5-xylenol, 2,6-xylenol,2,4-xylenol, catecohl, resorsin, pyrogallol, bisphenol A and the like.Examples of the alkyl phenol compound may include C₁₋₁₀ alkyl phenol,preferably C₁₋₄ alkylphenol, for example, p-isopropylphenol,p-tert-butylphenol, p-tert-amylphenol, p-tert-octylphenol and the like.

A condensation reaction of the above compounds with a carbonyl compoundsuch as formaldehyde, acetone and the like may be carried out by theknown process, so that the condensation in the presence of an alkalicatalyst may result insoluble and non-fusible resol type ones as thecondensation reaction proceeds, and that the condensation in thepresence of an acid catalyst may result soluble and fusible novolak typeones. The novolak type phenol resin is such that a molecular weightthereof may be increased as the condensation reaction proceeds, andpreferably may include ones prepared by carrying out the condensationreaction for 1 to 3 hours, and having a weight average molecular weightin the range of 500 to 2,000.

The other monomer copolymerizable with the hydroxyl group-containingvinyl aromatic compound may include the same other copolymerizablemonomer as examplified in the case of the copolymer in the above polymer(b).

The hydroxyphenyl group-containing polymer (c) preferably has a weightaverage molecular weight in the range of generally about 1,000 to about200,000, particularly about 1,000 to about 30,000.

The polymer (c) preferably has a hydroxyphenyl group content in therange of generally about 1.0 to about 10 equivalents, particularly about2.0 to about 8.0 equivalents per one kg of the polymer. A hydroxyphenylgroup content less than about 1.0 equivalent/kg may result in that acoating film formed by heating prior to irradiation of a visible lightmay show an unsatisfactory degree of crosslinking. On the other hand,when more than about 10 equivalents/kg, a resist film may be brittle.

As in the polymers (a) and (b), the polymer (c) preferably has a glasstransition temperature (Tg) in the range of about 0° C. or higher,particularly about 5 to 70° C. When the Tg is lower than about 0° C., asticky coating film may result adhesion of foreign particles, dust, etc.so as to be difficult to handle.

A mixing ratio of the compound (A₁) to the acid group-containingurethane resin (B₁), i.e. the compound (A₁)/resin (B₁); the compound(A₂) to the resin (B₂), i.e. the compound (A₂)/resin (B₂); or thecompound (A₂) to the resin (B₂), i.e. the compound (A₂)/resin (B₁) is inthe range of 0.5 to 50/99.5 to 50% by weight, preferably 1 to 30/99 to70% by weight, more preferably 1 to 15/99 to 85% by weight based on atotal weight of the compound (A₁) and the resin (B₁), the compound (A₂)and the resin (B₂), or the compound (A₂) and the resin (B₁)respectively. An amount less than 0.5% by weight of the compound (A₁) or(A₂), or more than 99.5% by weight of the resin (B₁) or (B₂) mayundesirably reduce developing solution-resistant properties in anon-irradiated area. On the other hand, an amount more than 50% byweight of the compound (A₁) or (A₂), or less than 50% by weight of theresin (B₁) or (B₂) may undersirably reduce sensitivity and storagestability.

Photo-acid Generator(C)

The generator (C) is a compound to generate an acid on irradiation of anactinic ray, is such that the resin may be decomposed in the presence ofthe generated acid as a catalyst, and may include ones known in the art.

Examples of the compounds and mixtures thereof to be used as thephoto-acid generator (C) may include diazonium, phosphonium, sulfoniumand iodonium salts; halides; combinations of an organometal andorganohalogen; benzoin and o-nitrobenzyl esters of a strong acid such astoluene sulfonic acid and the like; N-hydroxy amido andN-hydroxyimidosulfonates as disclosed in U.S. Pat. No. 4,371,605; andthe like, and also may include arylnaphthoquinone-diazido-4-sulfonates.A preferable photo-solubilizing agent may include diaryliodonium andtriarylsulfonium salts. Generally, these compounds may present in theform of the salts of multialloymetalhalide ions such astetrafluoroborate, hexafluoroantimonate, hexafluoroarsenate,hexafluorophosphite, and the like.

Other effective groups of the acid generator showing photo-curabilitymay include the oligomers and polymers, to which an anionic group havingan aromatic onium acid generator as positive pair ions is added. Theabove polymers may also include polymers disclosed at column 9, lines1-68, and column 10, lines 1-14 in U.S. Pat. No. 4,661,429 (as hereinreferred to).

For the purpose of controlling a spectrum sensitivity to an applicablewave length of the actinic ray, a sensitizer may preferably be added tothe above system. Necessity of the above addition may depend onrequirements in the system and specified photocurable compounds to beused. For example, in the case of iodonium and sulfonium saltsresponding to only a wave length less than 300 nm, use of benzophenoneand derivatives thereof, polycyclic aromatic hydrocarbons such asperylene, pyrene and anthracene, dirivatives thereof, etc. makes itpossible to be photocurable in a longer wave length. The decompositionof diaryliodonium and triarylsulfonium salts may also be madephotocurable by use of bis-(p-N,N-dimethylaminopentylidene)-acetone. Asulfonium salt bonded to anthracene having a chain length consisting of34 atoms is an effective photo-solubilizing agent. The compoundsdisclosed in M G. Tilley's doctoral thesis, North Dakota StateUniversity, Fargo, N. Dak. (1988) [Diss, Abstr. Int. B. 49,8791 (1989):Chem. Abstr. 111, 39942u] are preferable photo-solubilizing agents.Other preferable acid generator may include ATASS, i.e.3-(9-anthracenyl)propyl-diphenylsulfonium hexafluoroantimonate, which issuch that anthracene and the sulfonium salt are bonded through a chainconsisting of 3 carbon atoms. Additional examples of the acid generatorto herein be used may include diphenyliodonium tosylate, benzointosylate and triarylsulfonium hexafluoroantimonate.

Additional examples of the acid generator may include iron-allenecomplexes, ruthenium-allene complexes, silanol-metal chelate complexes,triazine compounds, diazidonaphthoquinone compounds, sulfonates,imidosulfonate, halogenated compounds, and the like, and may alsoinclude the acid generators described in Japanese Patent ApplicationLaid-Open No. 146552/95 and Japanese Patent Application No. 289218/97.

A mixing amount of the acid generator may be in the range of about 0.1to 40 parts by weight, particularly about 0.2 to 20 parts by weight per100 parts by weight of a total amount of the compound (A₁) and the resin(B₁), the compound (A₂) and the resin (B₂), or the compound (A₂) and theresin (B₁).

The positive type actinic ray-decomposing and developing resincomposition used in the dry film of the present invention may include anorganic solvent based resin composition prepared by dispersing ordissolving the above components, or finely dispersing fine pigmentparticles in the case where the pigment is used as a colorant, into anorganic solvent respectively.

Examples of the organic solvent used for dissolving or dispersing theabove components may include ketones such as acetone, methyl ethylketone, methyl isobutyl ketone and the like; esters such as ethylacetate, butyl acetate, methyl benzoate, methyl propionate and the like;ethers such as tetrahydrofuran, dioxane, dimethoxyethane and the like;cellosolves such as methylcellosolve, ethylcellosolve, diethylene glycolmonomethyl ether and the like; aromatic hydrocarbons such as benzene,toluene, xylene, ethylbenzene and the like; halogenated hydrocarbonssuch as chloroform, trichloroethylene, dichloromethane and the like;alcohols such as ethyl alcohol, benzyl alcohol and the like; others suchas demethylformamide, dimethylsulfoxide and the like: and the like.

The above resin composition may also include a water-based resincomposition prepared by neutralizing the carboxyl group in the resincomposition with a basic compound, followed by dissolving or dispersingthe neutralized product into water.

The resin composition used in the dry film of the present invention maybe in the form of a solid at room temperature when dried.

In the presence of an acid which is generated on exposing a coating filmformed from the resin composition used in the dry film of the presentinvention to actinic ray, an acid hydrolysis reaction may take place inan exposed area. For the purpose of smoothly proceeding the acidhydrohysis reaction, presence of water is desirable, and addition to theresin composition of a hydrophilic resin such as polyethylene glycol,polypropylene glycol, methylcellulose, ethylcellulose and the like makesit possible to easily introduce the water necessary for the abovereaction into the resulting coating film. An amount of the hydrophilicresin may be in the range of generally 20 parts by weight or less,preferably 0.1 to 10 parts by weight per 100 parts by weight of theresin component.

In addition to the above components, the resin composition used in thepresent invention may optionally contain the other resins which areinsoluble, soluble or dispersible in water or an organic solvent, andimprove or impair solubility in the organic solvent or an aqueousdeveloping solution. Examples of the other resins may include phenolicresin, polyester resin, acrylic resin, vinyl resin, vinyl acetate resin,epoxy resin, silicone resin, fluorocarbon resin, mixtures thereof,modified products thereof, and the like.

For the purpose of imparting suitable flexibility, non-tackiness,tackiness and the like to the resulting dry film, the resin compositionused in the present invention may contain plasticizers such as phthalateand the like, polyester resin, acrylic resin, and the like.

The resin composition used in the present invention may optionallycontain flowability regulators, plasticizers, dyes, coloring agents suchas pigments and the like, and the like.

The method of the present invention may be applicable to any useswithout particular limitations, so long as the above steps are included.

The coating substrate used in the present invention may includesubstrates of conductor, insulator, semiconductor, combination thereofas used in the following uses.

Examples of the above uses in respective industrial fields may includeelectrical fields such as electrical parts, lightings, electricalelements, semiconductors, printings, printed circuits, electroniccommunications, electric powers and he like; physical fields such asinstrumentations, optical field, indications, acoustic field,controllings, vending field, signals, information recording field, andthe like; chemistry.metallurgy.fiber fields such as inorganic chemistry,organic chemistry, polymer chemistry, metallurgy, fiber and the like:treatment.transportation fields such as separation.mixing, metalprocessing, plastics processing, printings, containers, packings and thelike; articles for living, for example, agricultural and marine fields,foods fermentations, domestic articles, health.amusement fields, and thelike; mechanical engineering, and the like.

The method of the present invention is a method of forming a patternwhich comprises the following steps:

-   (1) applying the positive type actinic ray-decomposing and    developing dry film as above described onto the surface of a coating    substrate so that the surface of the coating substrate may face to    the urethane resin layer of the dry film,-   (2) optionally stripping the nonactinic ray-decomposing and    developing substrate of the dry film,-   (3) irradiating an actinic ray through a mask or directly onto the    surface of the dry film so as to obtain an intended pattern,    optionally heat treating,-   (4) stripping the nonactinic ray-decomposing and developing    substrate not stripped in the above step (2),-   (5) subjecting the positive type actinic ray-decomposing and    developing urethane resin layer to a developing treatment, and-   (6) removing an unnecessary area of the urethane resin layer to form    a resist pattern film, either step (1) or (2) including a step of    heat

The dry film may be applied onto the coating substrate so that thepositive type actinic ray-decomposing and developing resin coating filmlayer may face to the surface of the coating substrate such as aconductive circuit board having non-through and/or through-holes and maybe laminated thereonto, followed by heat laminating while pressuringonto the surface of the substrate in the dry film so as to bond theconductive substrate to the surface of the resin coating film layer.Heat laminating step may be carried out by heating the conductivesubstrate, heating from the surface of the substrate in the dry film, orboth. The heating temperature may be in the range of usually 60 to 150°C., particularly 80 to 120° C.

On applying the dry film to the surface of the coating substrate,treatment of the surface of the substrate with a liquid, for example, anadhesive-promoting solution as described in Jones (U.S. Pat. No.3,645,772), a solvent for use in a resist film as described in Fickes,or a swelling agent makes it possible to improve adhesion propertiesbetween the surface of the coating substrate and the dry film. The aboveliquid may have photo-decomposing and developing properties as thephotoresist solution disclosed in lsaacson (U.S. Pat. No. 3,629,036).The application of the dry film to the coating substrate may be carriedout by use of a vacuum-laminating apparatus.

The above heat treatment may be carried out at such temperatureconditions that a crosslinking reaction between the compound (A₁) andthe acid group-containing urethane resin (B₁), the compound (A₂) and theresin (B₂), or the compound (A₂) and the resin (B₁) may substantiallytake place, for example, by heating at about 60° C. to about 150° C. forabout one minute to about 30 minutes.

Irradiation of the actinic ray may be carried out, for example, by amethod of irradiating the actinic ray through a photomask, a method ofdirectly drawing by laser scanning, and the like.

Examples of the actinic ray may include ultraviolet light, visiblelight, laser beam such as near ultrared rays, visible light laser,ultraviolet light laser and the like. An irradiation dose may be in therange of usually 0.5 to 2000 mJ/cm², preferably 1 to 1000 mJ/cm².

An irradiation source of the actinic ray may include ones known in theart, for example, light sources obtained from ultrahigh pressure mercurylamp, high pressure mercury lamp, moderate pressure mercury lamp, lowpressure mercury lamp, chemical lamp, carbon arc lamp, xenone lamp,metal halide lamp, fluorescent tube, tungsten lamp, sunlight and thelike; lights in visible light range as cut by a ultraviolet light-cutfilter, various lasers having an oscillating curse in the visible lightrange, and the like. A high power and stable laser beam source maypreferably include argon laser and YAG-SHG laser.

After the application of the dry film onto the surface of the coatingsubstrate, the substrate of the dry film may optionally be stripped fromthe positive type actinic ray-decomposing and developing resin coatingfilm layer. The stripping step may optionally be carried out after thefollowing actinic ray-irradiating step.

Irradiation of the actinic ray may preferably be followed by such a heattreatment as to heat under such temperature conditions that thecrosslinked structure of the cured coating film may be broken in thepresence of the acid generated on irradiation, for example, about 60° C.to about 150° C. for about one minute to 30 minutes.

The developing treatment may be carried out by washing out the resistfilm in an exposed area with an aqueous alkali solution, organicsolvent, water or the like. The aqueous alkali solution may includeaqueous solutions of alkaki such as caustic soda, sodium carbonate,caustic potash, ammonia, etc. The organic solvent to dissolve theexposed area may include, for example, 1,1,1-trichloroethane,trichloroethylene, methyl ethyl ketone, methylene chloride and the like.After the developing treatment, the resist film is washed with water,followed by drying with hot air or the like to form an intended image onthe conductor. Optionally, etching may be carried out to remove aconductor in an exposed area and to prepare a printed circuit board. Forexample, in the case where a conductive film in the printed circuitboard is copper, the conductive film in the exposed area may be removedby etching, that is, by use of an acid etching solution such as a cupricchloride solution and he like, and an alkaline etching solution such asan ammonia water and the like. According to the present invention, nodissolution of copper in the interior of the through-hole takes placewithout resulting breaking.

After the etching step, a remaining resist film may optionally beremoved. The removal of the remaining resist film may be carried out byuse of a stripping agent, which dissolves the resist film, butessentially does not impair the substrate and a conductive filmconstituting a circuit pattern on the surface of the substrate, forexample, by use of an aqueous solution of an alkali or acid, and variousorganic solvents.

In the case where a substrate having a conductive circuit pattern and athrough-hole and/or non-through hole is used as the conductive substratehaving the through-hole, a satisfactory covering of the resist film overthe through-hole, non-through hole and fine circuit pattern makes itpossible to easily form a solder resist and interlaminar insulating filmwith high reliability on electrical insulating properties, chemicalresistant properties, etc.

According to the present invention, the use of a positive type dry filmformed from a urethane linkage-containing, actinic ray-decomposing anddeveloping resin composition provides such effects that neither cracksnor stripping of the actinic ray-decomposing and developing coating filmdevelop on bending the dry film to be easily handled, and thatdeveloping and etching treatment make it possible to form a finepattern.

EXAMPLE

The present invention is explained more in detail by the followingExamples and Comparative Examples, in which “part” and “%” represent“part by weight” and “% by weight” respectively.

Preparation Example 1

Preparation of Vinyl Ether Group-containing Compound (A₁-1):

A 250 ml flask was charged with 45.6 parts of bisphenol A, 80 ml of2-chloroethyl vinyl ether and 100 ml of toluene, followed by introducingnitrogen, charging 20 parts of sodium hydroxide, heating at 80° C. for30 minutes, charging a solution prepared by dissolving 4.56 parts oftetrabutylammonium bromide into 20 ml of 2-chloroethyl vinyl ether,heating and reacting at 95° C. for 5 hours, washing a reaction productwith deionized water three times, separating an oil layer, andevaporating and removing 2-chloroethyl vinyl ether and toluene to obtaina vinyl ether compound (A₁-1) having a weight average molecular weightof 368 and containing 2 vinyl ether groups in one molecule.

Preparation Example 2

Preparation of Vinyl Ether Urethane Based Compound (A₂-1):

A mixture of 210 parts of trimethylhexamethylene diisocyanate. 232 partsof hydroxybutyl vinyl ether and 5 drops of pyridine was reacted at 90°C. for 6 hours to obtain a divinyl ether compound (A₂-1).

Preparation Example 3

Preparation of Vinyl Ether Urethane Based Compound (A₂-2):

A mixture of 875 parts of a 75% ethylene glycol dimethyl ether solutionof a polyisocyanate prepared by reacting one mole of trimethylolpropanewith 3 moles of tolylenediisocyanate, and 264 parts of 2-hydroxyethylvinyl ether was reacted in the presence of one part of dibutyltindiacetate at 35° C. for 3 hours to obtain a vinyl ether compound (A₂-2)containing 3 vinyl ether groups in one molecule and having a solidcontent of about 81%.

Preparation Example 4

Preparation of Acid Group-containing Urethane Resin (B₁-1):

A mixture of 275 parts of methyl ethyl ketone, 233 parts oftrimethyl-hexamethylene diisocyanate, 108 parts of tripropylene glycoland 73 parts of dimethylolbutanic acid was reacted at 80° C. for 10hours to obtain a reaction product, followed by reacting 24 parts ofhydroxyacetic acid with the above reaction product at 75° C. for 11hours to obtain a resin (B₁-1) having a weight average molecular weightof about 47,000 and a carboxy group content of 1,4 moles/kg i.e. an acidvalue of 79 mg KOH/g.

Preparation Example 5

Preparation of Acid Group-containing Urethane Resin (B₁-2):

A mixture of 596 parts of methyl ethyl ketone, 576 parts of isophoronediisocyanate, 81 parts of tripropylene glycol and 70 parts ofdimethylolbutanic acid was reacted at 80° C. for 10 hours to obtain aresin (B₁-2) having a weight average molecular weight of about 40,000and a hydroxyl group content of 1.6 moles/kg, i.e. an acid value of 88mg KOH/g.

Preparation Example 6

Preparation of Carboxyl Group-containing Resin (B₂-1):

A mixture of 216 parts of acrylic acid, 500 parts of styrene, 284 partsof n-butylmethacrylate, and 50 parts of azobisisobutylonitrile wasdropped into 600 parts of methyl isobutyl ketone heated at 80° C. andbeing stirred over 2 hours, followed by keeping at that temperature for2 hours to obtain a polymer (B₂-1) having a solid content of about 62.5%and a carboxyl group content of 3 moles/kg.

Preparation Example 7

Preparation of Carboxyl Group-containing Resin (B₂-2):

A mixture of 288 parts of acrylic acid, 300 parts of styrene, 255 partsof n-butylacrylate, 157 parts of 2-hydroxyethylacrylate and 100 parts oft-butylperoxybenzoate was dropped into 1000 parts of 2-butoxyethanolheated at 110° C. and being stirred over 2 hours, followed by keeping atthat temperature for 2 hours to obtain a polymer (B₂-2) having a solidcontent of about 50% and a carboxyl group content of 4 moles/kg.

Preparation Example 8

Preparation of Carboxyl Group and Hydroxyphenyl Group-containing Resin(B₂-3):

A mixture of 200 parts of tetrahydrofuran, 65 parts of p-hydroxystyrene,28 parts of n-butylacrylate, 11 parts of acrylic acid and 3 parts ofazobisisobutylonitrile was reacted at 100° C. for 2 hours to obtain areaction product, followed by injecting the reaction product into 1500ml of a toluene solvent, precipitating and separating the reactionproduct, and drying the precipitate at 60° C. to obtain a photo-curableresin (B₂-3) having a weight average molecular weight of about 5200 anda hydroxyphenyl group content of 4.6 moles/kg.

Preparation Example 9

Preparation of Hydroxyphenyl Group-containing Resin (B₂-4):

A flask was charged with 1490 parts of o-cresol, 1145 parts of 30%formalin, 130 parts of deionized water and 6.5 parts of oxalic acid,followed by heating under reflux for 60 minutes, adding 13.5 parts of15% chloric acid, heating under reflux for 40 minutes, adding 400 partsof deionized water at about 15° C., keeping the resulting mixture atabout 75° C. to precipitate a resin, adding 35% sodium hydroxydesolution, neutralizing, removing an aqueous layer, adding 400 parts ofdeionized water, washing the resin at 75° C., removing an aqueous layer,duplicating the same washing procedure 2 times, and drying at about 120°C. under vacuum to obtain a novolak phenol resin (B₂-4) having a weightaverage molecular weight of 600.

Example 1

A mixture of 90 parts of acid group-containing urethane resin (B₁-1), 10parts of vinyl ether group-containing compound (A₁-1), five parts ofphoto-acid generator NAI_(—)105 (trade name, marketed by Midori KagamkuCo., Ltd.) and two parts of 1,2,3-benzotriazole was dissolved incyclohexanone to obtain a photo-decomposing and developing solutionhaving a solid content of 28 percent.

The Photo-decomposing and developing solution was coated onto apolyethylene terephthalate film to be a dry film thickness of 10 μm by abar coater, followed by heating at 120° C. for 10 minutes to obtain adry film. Performances of the dry film are shown in Table 1. The dryfilm was laminated onto a through-hole plated, both side copper-cladedlaminate by use of a dry film laminator, followed by stripping thepolyethylene terephthalate film to obtain a coating substrate with aresist film. An ultraviolet light having an intensity of 50 mJ/cm² wasirradiated through a positive type mask onto the substrate by use of amercury lamp, followed by heating at 120° C. for 10 minutes, anddeveloping with a 0.75 percent aqueous sodium carbonate solution.Results are shown in Table 1. Thereafter, etching was carried out withan aqueous cupric chloride solution at about 40° C., followed byremoving the remaining resist film with a 3 percent aqueous caustic sodasolution to obtain a printed circuit board. Results are shown in Table1.

Examples 2 to 4 and Comparative Examples 1 to 2

Photo-decomposing and developing solutions were prepared according tothe formulations shown in Table 1 respectively, followed by preparingdry films in the same manner as in Example 1, and subjecting respectivedry films to the same tests as in Example 1. Results are shown in Table1.

TABLE 1 Compara- tive Examples Examples 1 2 3 4 1 2 Formulations A₁-1 1010 30 30 10 30 (part) B₁-1 90 70 B₁-2 90 70 B₂-1 90 70 Photo-acid 5 5 55 5 5 Generator 1, 2, 3- 2 2 2 2 2 2 benzo- triazole Dry filmApplication 2 2 2 2 2 2 performances Workability Tent- 2 2 2 2 1 1forming Properties Developing Properties 2 2 2 2 2 2 Anti-etchingproperties 2 2 2 2 1 1

Example 5

Example 1 was duplicated except that acid group-containing resin (B₂-1)and vinyl ether urethane based compound (A₂-1) were used. Results areshown in Table 2.

Examples 6-14 and Comparative Examples 3-7

Photo-decomposing and developing solutions were prepared according tothe formulations shown in Table 2 respectively, followed by preparingdry films in the same manner as in Example 5, and subjecting respectivedry films to the same tests as in Example 5. Results are shown in Table2.

TABLE 2 Examples Comparative Examples 5 6 7 8 9 10 11 12 13 14 3 4 5 6 7Formulation A₂-1 10 10 10 10 30 (parts) A₂-2 10 10 10 10 30 B₂-1 90 9070 90 70 B₂-2 90 90 70 90 B₂-3 90 90 90 B₂-4 90 90 90 A₁-1 10 10 10 1030 Photo-acid 5 5 5 5 5 5 5 5 5 5 5 5 5 5 5 Generator 1, 2, 3-benzo- 2 22 2 2 2 2 2 2 2 2 2 2 2 2 triazole Dry application 2 2 2 2 2 2 2 2 2 2 22 2 2 2 film workability performance tent- 2 2 2 2 2 2 2 2 2 2 1 1 1 1 1forming properties Developing properties 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2Anti-etching properties 2 2 2 2 2 2 2 2 2 2 1 1 1 1 1

Example 15

Example 1 was duplicated except that acid group-containing urethaneresin (B₁-1) and vinyl ether urethane based compound (A₂-1) were used.Results are shown in Table 3.

Examples 15-22 and Comparative Examples 8-9

Photo-decomposing and developing solutions were prepared according tothe formulations shown in Table 3 respectively, followed by preparingdry films in the same manner as in Example 15, and subjecting respectivedry films to the same tests as in Example 15. Results are shown in Table3.

TABLE 3 Compar- ative Examples Examples 15 16 17 18 19 20 21 22 8 9Formulations A₂-1 10 10 30 30 (parts) A₂-2 10 10 30 30 B₁-1 90 70 90 70B₁-2 90 70 90 70 A₁-1 10 30 B₂-1 90 70 Photo-acid 5 5 5 5 5 5 5 5 5 5Generator 1,2,3- 2 2 2 2 2 2 2 2 2 2 benzo- triazole Dry filmApplication 2 2 2 2 2 2 2 2 2 2 performances workability Tent- 2 2 2 2 22 2 2 1 1 forming Properties Developing properties 2 2 2 2 2 2 2 2 2 2Anti-etching properties 2 2 2 2 2 2 2 2 1 1

In Tables 1-3, formulations are all represented by “part”. The samephoto-acid generator as in Example 1 was used respectively.

Dry Film Performances Test Method:

Application Workability:

A dry film was press-bonded onto a surface-abrasive, copper-cladlaminate by use of a laminater, followed by stripping a substrate.Evaluation was made as follows.

-   2: A resin layer is completely transferred onto the copper-clad    laminate (good).-   1: The resin layer partly or wholly remains on the substrate    (failure).    Tent-Forming Properties;

A dry film was press-bonded onto a surface-abrasive, copper-cladlaminate having a through-hole by use of a laminater, followed bystripping a substrate.

Evaluation was made as follows.

-   2: A resin layer stretches over the through-hole to form a hollow    (good).-   1: The resin layer over the through-hole has breaks (failure).    Developing Properties:-   2: After developing, no resist residues remain on the coating    substrate (good).-   1: After developing, resist residues remain on the coating substrate    (failure).    Anti-etching Properties:-   2: An etching treatment after developing shows no changes on a    resist in a non-irradiated area including a hollow resin film on the    through-hole (good).-   1: The resist shows drawbacks such as swelling, dissolution,    stripping and the like (failure).

1. A method of forming resist pattern film which comprises the followingsuccessive steps: (1) applying a positive actinic ray decomposing anddeveloping dry film having on the surface of a nonactinic raydecomposing and developing substrate, a solid positive actinic raydecomposing and developing urethane resin layer formed by coating andheat-crosslinking a resin composition onto a surface of a coatingsubstrate consisting of a through-hole plated, both side copper-claddedlaminate so that the surface of the coating substrate may face to theurethane resin layer of the positive actinic ray decomposing anddeveloping dry film, said resin composition being (1) a resincomposition containing, as essential components, (A₁) at least oneunsaturated compound selected from the group consisting of a vinyl ethergroup-containing compound, vinyl ester group containing compound andpropenyl ester group-containing compound, (B₁) an acid group-containingurethane resin having a weight average molecular weight of 1,000 to200,000 and an acid group content in the range of 0.5 to 10 equivalentsper one kg of the resin, and (C) a photo-acid generator; (2) a resincomposition containing, as essential components, (A₂) at least oneunsaturated urethane based compound selected from the group consistingof a vinyl ether urethane based compound, vinyl ester urethane basedcompound and propenyl ester urethane based compound and propenyl esterurethane based compound, (B₂) at least one resin selected from the groupconsisting of (a) a carboxyl group and hydroxyphenyl group-containingpolymer, (b) a carboxyl group-containing polymer and (c) a hydroxyphenylgroup-containing polymer, and (C) a photo-acid generator, or (3) a resincomposition containing, as essential components, (A₂) at least oneunsaturated urethane based compound selected from the group consistingof a vinyl ether urethane based compound, (B₁) an acid group-containingurethane resin having a weight average molecular weight of 1,000 to200,000 and an acid group content in the range of 0.5 to 10 equivalentsper one kg of the resin, and (C) a photo-acid generator, (2) optionallystripping the non-actinic ray decomposing and developing substrate ofthe dry film, (3) irradiating an actinic ray through a mask or directlyonto the surface of the dry film so as to obtain an intended pattern,optionally followed by heat treating, (4) stripping the non-actinic raydecomposing and developing substrate not stripped in the above step (2),(5) subjecting the positive actinic ray decomposing and developingurethane resin layer to a developing treatment, and (6) removing anirradiating area of the urethane resin layer to form a resist patternfilm, either step (1) or (2) including a step of heat treating, and (7)etching the exposed copper cladded laminate.